[Objective] This paper proposes a framework to effectively identify technology opportunities with anomaly detection technique. [Methods] First, we constructed a similarity matrix and conducted multidimensional scaling analysis. Second, we identified potential technology opportunity from patents based on a variety of anomaly detection algorithm. Finally, we extracted the possible breakthroughs with the help of TRIZ’s laws of technology system evolution. [Results] We analyzed patent data from the DII database and then identified technology opportunities in different phases of the laser lithography field. We found that technology opportunities identified by the proposed framework became mainstream technologies later. [Limitations] The objectiveness and accuracy of the new method needs to be improved. [Conclusions] The proposed framework based on anomaly detection could effectively identify technology opportunities.
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